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Ultra-low aberration Catadioptric ArF lens features the world's highest NA (1.35). AS7 immersion system utilizes a unique, continuous-flow liquid film flow nozzle that provides the temperature and defect control and productivity required for immersion lithography. The Two-Wafer Stage System features 2 fully independent wafer stage units that allow precise stage control and high speed "free swapping" of the stage units to provide the highest productivity and stage accuracy in the industry. To meet the demands of extreme low-k1 lithography, the Canon In-House Solution Tool utilizes in-situ information to provide optimum exposure conditions.
Specifications
FPA-7000AS7 | ArF (193nm) Scanner | Resolution | <45nm | NA | 0.85 – 1.35 (Automatically Variable) | Reticle Size | 6-inch (0.25-inch thickness) | Reduction Ratio | 4:1 | Field Size | 26mm x 33mm | Overlay Accuracy | Mean + 3 sigma < 6nm | | |
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