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Ultra-low aberration ArF lens features the world's highest "dry" NA (0.93).
Newly designed advanced illumination system offers increased flexibility and efficiency in creating illumination conditions using Canon's Advanced Flexible Illuminator System (AFIS) and optional polarized illumination system (Option). The Two-Wafer Stage System features 2 fully independent wafer stage units that allow precise stage control and high speed "free swapping" of the stage units to provide the highest productivity and stage accuracy in the industry. To meet the demands of extreme low-k1 lithography, the Canon In-House Solution Tool utilizes in-situ information to provide optimum exposure conditions.
Specifications
FPA-7000AS5 | ArF (193nm) Scanner | Resolution | <65nm | NA | 0.60 – 0.93 (Automatically Variable) | Reticle Size | 6-inch (0.25-inch thickness) | Reduction Ratio | 4:1 | Field Size | 26mm x 33mm | Overlay Accuracy | Mean + 3 sigma < 8nm | | |
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