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High resolution, wide-field lens, extra NA variability, plus reticle options. High alignment accuracy for CMP processes. Two off-axis methods in addition to Canon's original technology. High throughput features include a six-axis non-contact FLAT (Fast Linear Air-guided Tilting) stage and on-the-fly smoothing focus.
Designed for high CoO and efficient operation which is achieved through common parameters for main-body structure, operation and maintenance. By partnering for example with the FPA-3000EX6 KrF Stepper the i5+ delivers truly optimized mix-and-match lithography.
Specifications
FPA-3000i5+ | i-line (365nm) Stepper | Resolution | 0.35 micron | NA | 0.63 – 0.45 (Automatically Variable) | Reticle Size | 6-inch (0.25-inch thickness) ;
5-inch optional | Reduction Ratio | 5:1 | Field Size | 22mm x 22mm | Overlay Accuracy | Mean + 3 sigma < 40nm | Throughput | 100 wph (200mm) |
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