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With its newly designed 2:1 lens, the FPA-5500iX can expose a 50mm x 50mm area in a single shot. Its high-speed wafer stage design, extremely fast step and settle times, and illumination system with 4.5kW super high-pressure mercury lamp enables a
throughput of 120wph on 300mm wafers and 160wph on 200mm wafers. The FPA-5500iX is a 300mm CCD/LCD capable Stepper designed for mix-and-match partnership with the FPA-5000ES4 and FPA-5000AS3 for optimal processing at either 300mm or 200mm wafer sizes. Being reticle SMIF and automation ready, its 300mm fab automation features are state of the art and include in-line loading on the front, left, or right.
Specifications
FPA-5500iX | i-line (365nm) Stepper | Resolution | 0.50 micron | NA | 0.37 – 0.28 (Automatically Variable) | Reticle Size | 6-inch (0.25-inch thickness) | Reduction Ratio | 2:1 | Field Size | 50mm x 50mm | Overlay Accuracy | Mean + 3 sigma < 60nm | Throughput | 120 wph (300mm)
160 wph (200mm) |
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